Inline Frequency Adjustment Device "SFE-X2012"
Compact design, high precision, low price, high stability, high reproducibility.
The inline frequency adjustment device "SFE-X2012" separates the processing chamber from the extraction chamber and is equipped with ion sources for both high and low frequencies, enabling efficient operation with minimal idle time. It is equipped with two IGF-201 type 100mm beam ion sources, which were also used in the SFE-B03. Each ion source can process up to 24 units simultaneously, for a total of 48 units. The device adopts the high precision, high stability, and high reproducibility transport mechanism proven in the SFE-B03. Frequency adjustment for small workpieces (2.0×1.6, 1.6×1.2), which was previously difficult in inline processes, can now be stably mass-produced. Each unit allows for the disassembly of individual devices, designed with maintenance in mind. 【Device Performance】 ○ Tact Time: 0.3 sec/pc or less * For workpieces over 18MHz and more than 24 units in a row ○ Adjustment Accuracy: ±1.5 ppm or less ○ Processing Capacity: Up to 24 rows (p4.0) × 32 columns ○ Production Volume: Over 12,000 pcs/hour For more details, please contact us or download the catalog.
- Company：昭和真空
- Price：Other
